| 摘要 |
The present invention provides a method for producing a metal oxide film by alternatingly repeating the following steps two or more times: a step for coating a substrate with a solution containing a metal nitrate, and forming a metal oxide precursor film by drying the coated film; and a step for changing the metal oxide precursor film into a metal oxide film. During the steps performed two or more times for changing the metal oxide precursor film into the metal oxide film, the metal oxide precursor film is changed into the metal oxide film with a maximum attained substrate temperature of 120-250°C. The present invention further provides a metal oxide film produced by this method, and a device provided with the same. |
