发明名称 半導体受光素子及びその製造方法
摘要 PROBLEM TO BE SOLVED: To reduce parasitic capacitance and to prevent breaking of wire.SOLUTION: A semiconductor photodetector includes: a mesa-shaped light-receiving portion 20 provided on an InP substrate 10 and having a stack structure including an n-type InP layer 22a and a p-type InP layer 26; mesa-shaped electrode connection portions 30a to 30d provided on the InP substrate and including the same stack structure as the light-receiving portion; an insulating film 16 buried between the electrode connection portion 30a and the light-receiving portion; p-electrode wiring 42 and p-side wiring 44 provided so as to extend on the insulating film and electrically connecting a p-electrode pad 40 and the p-type InP layer 26; n-electrode wiring 54 and n-side wiring 56 electrically connecting the n-type InP layer 22a extending below the insulating film and an n-electrode pad 50 in the light-receiving portion; and a groove 38a electrically separating an n-type InP layer 32 and the n-type InP layer 22a in the electrode connection portion 30a. The n-type InP layer 22a is provided under the n-electrode wiring 54 and the n-side wiring 56 over the entire extending region.
申请公布号 JP6094011(B2) 申请公布日期 2017.03.15
申请号 JP20120081964 申请日期 2012.03.30
申请人 住友電工デバイス・イノベーション株式会社 发明人 堂本 新一
分类号 H01L31/10 主分类号 H01L31/10
代理机构 代理人
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