| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma state measuring probe and a plasma state measuring apparatus, as simple monitors, that are able to accurately measure an electron density, a type of emission species, and a spatial distribution of the density of the emission species.SOLUTION: The plasma state measuring apparatus comprises: a measuring probe 10 that is attached to an inside of a chamber of a plasma processing apparatus; and a probe control apparatus that is connected to the measuring probe 10 and that is provided on an outside of the chamber. The measuring probe 10 includes an electron density measuring unit 10A for measuring an electron density, and a plasma emission measuring unit 10B for measuring plasma emission emitted from emission species of plasma. The electron density measuring unit 10A includes a planar antenna section 11 made of a conductive plate, a coaxial coupling section 12 for causing electric field excitation on the antenna section 11, and a coaxial cable 13 for feeding the antenna section 11 and receiving a reflected signal. The plasma emission measuring unit 10B includes an optical transmission path 14. |
