发明名称 Apparatus and method for noninvasively determining positioning of a component beneath a substrate
摘要 A method of noninvasively determining desired positioning of a component beneath a substrate is described. The component has a concealing surface longitudinally separated by a substrate body from an accessible surface of the substrate. A component having longitudinally differing activated and deactivated positions is provided. The component is located longitudinally beneath the concealing surface of the substrate. The accessible surface of the substrate is inspected with an inspection device while the component is beneath the concealing surface. With the inspection device, at least one of an activated and a deactivated position of the component is detected. The detected activated and/or deactivated position of the component is indicated, in a user-perceptible format. An apparatus for noninvasively determining desired positioning of a component beneath a substrate is also provided.
申请公布号 US9581722(B2) 申请公布日期 2017.02.28
申请号 US201514728716 申请日期 2015.06.02
申请人 Northrop Grumman Systems Corporation 发明人 Neal Matthew
分类号 G01V5/00;B64F5/00;F16B1/00 主分类号 G01V5/00
代理机构 Tarolli, Sundheim, Covell & Tummino LLP 代理人 Tarolli, Sundheim, Covell & Tummino LLP
主权项 1. A method of noninvasively determining desired positioning of a component beneath a substrate having a concealing surface longitudinally separated by a substrate body from an accessible surface of the substrate, the method comprising: providing a component having longitudinally differing activated and deactivated positions, the component being located longitudinally beneath the concealing surface of the substrate; inspecting, with an inspection device from the accessible surface of the substrate the component located beneath the accessible and concealing surfaces; detecting, with the inspection device, at least one of an activated and a deactivated position of the component; and indicating, in a user-perceptible format, the detected activated and/or deactivated position of the component.
地址 Falls Church VA US