| 发明名称 |
Method of Mask Data Synthesis and Mask Making |
| 摘要 |
The present disclosure provides an integrated circuit (IC) method in accordance with some embodiments. The method includes receiving an IC design layout; and performing an inverse beam technology (IBT) process to the IC design layout, thereby generating a final mask pattern, wherein the IBT process uses a single IBT model to simulate both a mask making process and a wafer making process. |
| 申请公布号 |
US2017053056(A1) |
申请公布日期 |
2017.02.23 |
| 申请号 |
US201514832026 |
申请日期 |
2015.08.21 |
| 申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Huang Hsu-Ting;Liu Ru-Gun;Chou Shuo-Yen;Gau Tsai-Sheng |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An integrated circuit (IC) method comprising:
receiving an IC design layout; and performing an inverse beam technology (IBT) process to the IC design layout, thereby generating a final mask pattern, wherein the IBT process uses a single IBT model to simulate both a mask making process and a wafer making process. |
| 地址 |
Hsin-Chu TW |
