| 摘要 |
Contaminant is prevented from migracing from a gripping hand and contaminating a substrate ease after cleaning the substrate case. The apparatus cleans, in a state with no substrate, a substrate case C which holds a substrate, provided with a hooch 10 which forms a clean space, provided with cleaning tanks 40, 50 which hold and clean the parts of the substrate case C in a separated status in this booth 10, provided with a conveyance mechanism 60 which grips part of the substrate case C by a gripping hand 70 and conveys them to and from the cleaning tanks 48, 50, making the gripping hand 60 stand by at a standby position Q in the booth 10 during cleaning of the substrate case C, and provided with a cleaning means 80 for cleaning the gripping hand 70 daring cleaning of the parts. The cleaning means 80 is provided with a spray nozzle 81 which sprays a gas toward the gripping hand 70 and an exhaust fan 82 which exhausts the gas from the inside of the booth 10. |
