| 摘要 |
A first light-shied-coating formation step that forms a light shield coating only in a part of an area of a transparent-substrate in which a light shield coating is to be formed, a step that deposits an optical thin film including, as its outermost layer, a layer to be hydrothermally treated, which will become a fine uneven pattern coating by being hydrothermally treated, in an area in which an antireflection coating is to be formed, a second light-shield-coating formation step that forms a light shield coating in all of the area in which the light shield coating is to be formed, but the light shield coating was not formed in the first light-shield-coating formation step, and a step that forms the fine uneven pattern coating in the area in which the antireflection coating is to be formed by hydrothermally treating the layer to be hydrothermally treated are performed in this order. |
