发明名称 |
Method of obtaining a yellow gold alloy deposition by galvanoplasty without using toxic materials |
摘要 |
The invention concerns the field of galvanic depositions and relates to a method of galvanoplastic deposition of a gold alloy on an electrode dipped into a bath including metal gold in alkaline aurocyanide form, organometallic compounds, a wetting agent, a sequestering agent and free cyanide. According to the invention, the alloy metals are copper, in double copper and potassium cyanide form, and silver in cyanide form, allowing a mirror bright yellow gold alloy to be deposited on the electrode. |
申请公布号 |
US9567684(B2) |
申请公布日期 |
2017.02.14 |
申请号 |
US201414452364 |
申请日期 |
2014.08.05 |
申请人 |
The Swatch Group Research and Development Ltd |
发明人 |
Henzirohs Christophe;Plankert Guido |
分类号 |
B32B15/00;C25D3/62;B05D1/18;C25D3/56;C25D7/00;C25D3/58 |
主分类号 |
B32B15/00 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. An electrolytic deposition comprising:
a galvanoplastically deposited gold alloy layer, said alloy being a bright 3N colour gold alloy composition of 75% gold, 21% copper, and 4% silver, and being free of cadmium and zinc, said layer being between about 1 μm and about 800 μm thick, wherein a structure of said alloy composition is formed by dipping an electrode into a bath comprising a proportion of 9.08% gold metal in alkaline aurocyanide form, 90.85% copper metal in alkaline double cyanide form, 0.07% silver metal, organometallic compounds, a wetting agent, a sequestering agent, and free cyanide. |
地址 |
Marin CH |