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发明名称
PHOTO-MASKS FOR LITHOGRAPHY
摘要
A photo-mask for use in extreme ultraviolet (EUV) lithography, in which the photo-mask has low coefficient of thermal expansion and high specific stiffness.
申请公布号
EP3127144(A1)
申请公布日期
2017.02.08
申请号
EP20150772966
申请日期
2015.04.01
申请人
Zygo Corporation
发明人
TRICARD, Marc
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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