| 摘要 |
PURPOSE: A multi-gray scale photomask is provided to suppress the photosensitivity of a resist film in a region separated from an interference of a transparent part or semitransparent part. CONSTITUTION: A multi-gray scale photomask(100) comprises a transcription pattern a transmittance part(102), a light shielding part(101), and a semitransparent part(103) by patterning an optical film on a transparent substrate and forms resist patterns with different residue values on an object. The optical film 180° shifts phases of representative wavelength in exposed light of the multi-gray scale photomask and has 3-50% transmittancy with regard to the representative wavelength. |
