发明名称 Photoresist composition and method for producing photoresist pattern
摘要 A photoresist composition comprising a resin which has no acid-labile group and which comprises a structural unit represented by formula (I);; and a structural unit represented by formula (a4); ;a resin which has an acid-labile group; andan acid generator.
申请公布号 US9563124(B2) 申请公布日期 2017.02.07
申请号 US201313949700 申请日期 2013.07.24
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 Masuyama Tatsuro;Yamaguchi Satoshi;Ichikawa Koji
分类号 G03F7/004;G03F7/38;G03F7/039;G03F7/20 主分类号 G03F7/004
代理机构 Birch, Stewart, Kolasch & Birch, LLP 代理人 Birch, Stewart, Kolasch & Birch, LLP
主权项 1. A photoresist composition comprising: a resin which has no acid-labile group and which comprises a structural unit represented by formula (I): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a C3-C18 alicyclic hydrocarbon group where a hydrogen atom can be replaced by a C1-C8 aliphatic hydrocarbon group or a hydroxyl group provided that the carbon atom attached to L1 is unsubstituted with a C1-C8 aliphatic hydrocarbon group, and L1 represents a single bond or a C1-C18 divalent saturated hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group, and a structural unit represented by formula (a4): wherein R3 represents a hydrogen atom or a methyl group, and R4 represents a C1-C24 fluorine-containing saturated hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; a resin which has an acid-labile group; and a salt represented by formula (B1): wherein Qb1 and Qb2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, Lb1 represents a moiety represented by any one of formulae (b1-1) to (b1-7): wherein Lb2 represents a single bond or a C1-C15 divalent saturated hydrocarbon group, Lb3 represents a single bond or a C1-C12 divalent saturated hydrocarbon group and Lb4 represents a C1-C13 divalent saturated hydrocarbon group provided that the total number of the carbon atoms in Lb3 and Lb4 is up to 13, Lb5 represents a single bond or a C1-C14 divalent saturated hydrocarbon group, and Lb6 represents a C1-C15 divalent saturated hydrocarbon group provided that the total number of the carbon atoms in Lb5 and Lb6 is up to 15, Lb7 represents a single bond or a C1-C15 divalent saturated hydrocarbon group and Lb8 represents a C1-C15 divalent saturated hydrocarbon group with the proviso that total carbon number of Lb7 and Lb8 is up to 16, Lb9 represents a single bond or a C1-C13 divalent saturated hydrocarbon group and Lb10 represents a C1-C14 divalent saturated hydrocarbon group, with the proviso that total carbon number of Lb9 and Lb10 is up to 14, Lb 11 and Lb 12 each independently represent a single bond or a C1-C11 divalent saturated hydrocarbon group, and Lb13 represents C1-C12 divalent saturated hydrocarbon group, with the proviso that total carbon number of Lb11 , Lb12 and Lb13 is up to 12, Lb14 and Lb15 each independently represent a single bond or a C1-C13 divalent saturated hydrocarbon group, and Lb16 represents C1-C14 divalent saturated hydrocarbon group, with the proviso that total carbon number of Lb14, Lb15 and Lb16 is up to 14, and * represents a binding position, * of the left side represents a binding position to —C(Qb1)(Qb2)—; Y represents a C3-C18 alicyclic hydrocarbon group where a methylene group can be replaced by an oxygen atom, a sulfonyl group or a carbonyl group and where a hydrogen atom can be replaced by a substituent, and Z1+represents an organic cation.
地址 Tokyo JP