发明名称 OXIDE SINTERED BODY AND SEMICONDUCTOR DEVICE
摘要 There is provided an oxide sintered body including indium, tungsten, and at least one of zinc and tin, wherein the oxide sintered body includes, as a crystal phase, a complex oxide crystal phase including tungsten and at least one of zinc and tin. There is also provided a semiconductor device including an oxide semiconductor film formed by a sputtering method by using the oxide sintered body as a target.
申请公布号 US2017029933(A1) 申请公布日期 2017.02.02
申请号 US201515100174 申请日期 2015.04.08
申请人 Sumitomo Electric Industries, Ltd. 发明人 Miyanaga Miki;Watatani Kenichi;Sogabe Koichi;Awata Hideaki;Kurisu Kenichi
分类号 C23C14/34;C04B35/622;H01L29/786;C23C14/08;H01L21/02;H01L29/66;C04B35/495;H01J37/34 主分类号 C23C14/34
代理机构 代理人
主权项 1. An oxide sintered body comprising indium, tungsten, and at least one of zinc and tin, wherein said oxide sintered body includes, as a crystal phase, a complex oxide crystal phase including tungsten and at least one of zinc and tin.
地址 Osaka-shi JP