发明名称 |
HYBRID DIELECTRIC NON-VOLATILE MEMORY WITH NANO PARTICLES (SI/SIO2 CORE/SHELL) AS CHARGE TRAPPING LAYER |
摘要 |
Si/SiO 2 core/shell nanostructures with sizes below 30nm as trapping points in UV curable hybrid organic-inorganic gate dielectrics are presented in order to investigate printable nano floating gate transistors. Not only does the novelty of this invention comes from fabricating high-quality hybrid organic/inorganic gate dielectric layer by Sol-Gel process at low temperature but also incorporating the monolayer of high-density of Si nanoparticles (NPs) without obvious interface defects and keeping the quality of dielectric layers. Fixed-charge trapping defects are successfully removed from hybrid dielectrics by UV curing together with low temperature thermal curing and mobile charges solely related to Si/SiO 2 core/shell nanostructures on charge trapping layer clearly demonstrate memory effects on printable device. Thin/uniform SiO 2 shell on each Si NP functions as tunneling layer of flash memory devices, significantly simplifying the fabrication of printable nano floating gate memory device. |
申请公布号 |
EP3125295(A1) |
申请公布日期 |
2017.02.01 |
申请号 |
EP20150182367 |
申请日期 |
2015.08.25 |
申请人 |
Nano and Advanced Materials Institute Limited |
发明人 |
SUN, Caiming;ZHAO, Chun;WONG, Ka Chon |
分类号 |
H01L29/423;H01L21/28 |
主分类号 |
H01L29/423 |
代理机构 |
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代理人 |
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地址 |
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