发明名称 |
Vapor compression refrigeration chuck for ion implanters |
摘要 |
Aspects of the present invention relate to ion implantation systems that make use of a vapor compression cooling system. In one embodiment, a thermal controller in the vapor compression system sends refrigeration fluid though a compressor and a condenser according to an ideal vapor compression cycle to help limit or prevent undesired heating of a workpiece during implantation, or to actively cool the workpiece. |
申请公布号 |
US9558980(B2) |
申请公布日期 |
2017.01.31 |
申请号 |
US201012725508 |
申请日期 |
2010.03.17 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
Lee William D.;Purohit Ashwin M.;LaFontaine Marvin R. |
分类号 |
H01L21/687;H01L21/683;H01J37/20;H01J37/317;H01L21/67 |
主分类号 |
H01L21/687 |
代理机构 |
Eschweiler & Associates, LLC |
代理人 |
Eschweiler & Associates, LLC |
主权项 |
1. An ion implantation system comprising:
a beamline assembly configured to steer an ion beam from an ion source towards an electrostatic chuck, wherein the electrostatic chuck includes an engagement region adapted to selectively retain a workpiece for implantation by the ion beam; a compressor configured to receive vapor-phase refrigerant fluid from the electrostatic chuck and compress the vapor-phase refrigerant fluid to provide a compressed refrigerant fluid; a condenser configured to condense the compressed refrigerant fluid to provide a condensed refrigerant fluid; and a supply conduit to transport the condensed refrigerant fluid from the condenser to the electrostatic chuck, wherein the electrostatic chuck includes a cavity or recess to expand and vaporize the condensed refrigerant fluid to cool the engagement region of the electrostatic chuck, and wherein the cavity or recess comprises:
a flow restrictor which is defined in a body of the electrostatic chuck; anda cooling channel which is disposed in the body of the electrostatic chuck and which is downstream of the flow restrictor, wherein the flow restrictor comprises:
first and second distal flow restrictor regions having respective sidewalls separated by a first flow restrictor width, wherein the first distal flow restrictor region is proximate to the supply conduit and the second distal flow restrictor region is proximate to the cooling channel; anda central flow restrictor region separating the first and second distal flow restrictor regions and having sidewalls separated by a second flow restrictor width that is greater than the first flow restrictor width. |
地址 |
Beverly MA US |