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发明名称
半導体装置およびその製造方法
摘要
半導体チップ1が接合部材2a、2bを介して導電部材3a、3bに電気的に接続された実装構造を有する半導体装置の熱抵抗の低減と熱変形吸収性の向上を両立させるため、接合部材2a、2bは、半導体チップ1に近い側から順に、ナノオーダーサイズを有する複数のスプリングで構成されるナノスプリング層4と、前記複数のスプリングを支持する平面層5と、接合層6とを備えた積層構造を有し、ナノスプリング層4の厚さは、接合層6の厚さよりも大きく、接合層6の厚さは、平面層5の厚さよりも大きい。
申请公布号
JPWO2014109014(A1)
申请公布日期
2017.01.19
申请号
JP20140556250
申请日期
2013.01.09
申请人
株式会社日立製作所
发明人
谷江 尚史;池田 靖
分类号
H01L21/52;H01L21/28;H01L21/285;H01L23/48;H01L29/861;H01L29/868
主分类号
H01L21/52
代理机构
代理人
主权项
地址
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