发明名称 MOVABLE SUPPORT AND LITHOGRAPHIC APPARATUS
摘要 The present invention relates to a movable support configured to support an object, comprising: a support plane to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly comprises: a first actuator configured to exert a first actuation force in a first actuation direction, said first actuation direction being parallel to the support plane, a second actuator configured to exert a second actuation force in a second actuation direction, said second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.
申请公布号 NL2016688(A) 申请公布日期 2017.01.17
申请号 NL20162016688 申请日期 2016.04.28
申请人 ASML NETHERLANDS B.V. 发明人 ANTONIUS FRANCISCUS JOHANNES DE GROOT;THEO ANJES MARIA RUIJL;CHRISTIAAN LOUIS VALENTIN;CHRISTIAN WERNER
分类号 G03F7/20 主分类号 G03F7/20
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