METHODS AND SYSTEMS FOR GENERATING A THREE-DIMENSIONAL HOLOGRAPHIC MASK

摘要

A system for surface patterning using a three dimensional holographic mask includes a light source configured to emit a light beam toward the holographic mask. The holographic mask can be formed as a topographical pattern on a transparent mask substrate. A semiconductor substrate can be positioned on an opposite site of the holographic mask as the light source and can be spaced apart from the holographic mask. The system can also include a base for supporting the semiconductor substrate.

主权项

1. An iterative pixelated perturbation method of generating a three dimensional holographic mask based on a predetermined three dimensional pattern, comprising:
providing a starting pattern for the holographic mask; computing images at multiple planes parallel to the holographic mask using a processor; computing an image metric representing a combination of diffraction efficiency of the holographic mask and fidelity of a resulting image compared with the predetermined pattern for the images at the multiple planes using the processor; perturbing an optic height of a first pixel in the starting pattern to create an intermediate pattern; computing the resulting intermediate images and computing an intermediate metric for the intermediate pattern; and determining whether the intermediate metric for the intermediate pattern is an improvement over the metric for the starting pattern, wherein the holographic mask is formed as a topographical pattern of the predetermined three dimensional pattern on a transparent mask substrate and includes multiple discrete levels at defined elevations.