发明名称 |
Substrate processing device and substrate processing method |
摘要 |
A substrate processing device 100 includes a cleaning liquid supply unit 114 supplying a cleaning liquid to a surface of a substrate W, a solvent supply unit 115 supplying a volatile solvent to the surface of the substrate W supplied with the cleaning liquid to replace the cleaning liquid on the surface of the substrate W with the volatile solvent, a heating unit 117 heating the substrate W supplied with the volatile solvent, and a drying unit 118 drying the surface of the substrate W by removing a droplet of the volatile solvent produced on the surface of the substrate W by a heating operation of the heating unit 117, and the heating unit 117 and the drying unit 118 are arranged in a course of transportation of the substrate W transported from the solvent supply unit 115. |
申请公布号 |
EP2782128(B1) |
申请公布日期 |
2017.01.11 |
申请号 |
EP20140160175 |
申请日期 |
2014.03.17 |
申请人 |
Shibaura Mechatronics Corporation |
发明人 |
Hayashi, Konosuke;Furuya, Masaaki;Ootagaki, Takashi;Nagashima, Yuji;Kinase, Atsushi;Abe, Masahiro |
分类号 |
H01L21/67;H01L21/677 |
主分类号 |
H01L21/67 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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