发明名称 半導体装置
摘要 A first field-effect transistor provided over a substrate in which an insulating region is provided over a first semiconductor region and a second semiconductor region is provided over the insulating region; an insulating layer provided over the substrate; a second field-effect transistor that is provided one flat surface of the insulating layer and includes an oxide semiconductor layer; and a control terminal are provided. The control terminal is formed in the same step as a source and a drain of the second field-effect transistor, and a voltage for controlling a threshold voltage of the first field-effect transistor is supplied to the control terminal.
申请公布号 JP6059873(B2) 申请公布日期 2017.01.11
申请号 JP20120011663 申请日期 2012.01.24
申请人 株式会社半導体エネルギー研究所 发明人 藤田 雅史;塩野入 豊;戸松 浩之;小林 英智
分类号 H01L29/786;H01L21/8234;H01L27/08;H01L27/088 主分类号 H01L29/786
代理机构 代理人
主权项
地址