ELECTROMAGNETIC PULSE IRRADIATION METHOD AND ELECTROMAGNETIC PULSE IRRADIATION SYSTEM

摘要

An electromagnetic pulse irradiation method comprising: a step in which the position of a target object comprising an electronic device is specified; a step in which a focal point is set in accordance with the position of the target object; and a step in which laser light is focused on the focal point, plasma is generated at the focal point, and an electromagnetic pulse generated from the plasma is irradiated on the electronic device. As a result, an electromagnetic pulse irradiation method and system are provided whereby scattering of the electromagnetic pulse can be suppressed and a high-output electromagnetic pulse irradiated.