| 摘要 |
PURPOSE: To provide a multi-beam lithography apparatus capable of reducing the irradiation amount error, without increasing the number of paths of multiple drawing.CONSTITUTION: A lithography apparatus 100 includes a data division unit 54 receiving first irradiation time data for k paths defined by n bits, for every beam irradiation position when performing multiple drawing of k paths or more by using a multi-beam, and dividing the first irradiation time data for k paths into k second irradiation time data of different number of bits the preset total of which is n bits, a data transfer processing unit 56 for transferring the corresponding second irradiation time data out of the k second irradiation time data for that beam, for each path, a resolution information transfer processing unit 58 for transferring the corresponding resolution information out of the k resolution information, for each path, an irradiation time calculation unit 74 for calculating the irradiation time of the corresponding beam out of the multi-beam in the path by using the transferred resolution information and second irradiation time data, for each path, and a drawing unit 150 for drawing a pattern in a sample by using a multi-beam including the corresponding beam of calculated irradiation time, for each of k paths.SELECTED DRAWING: Figure 1 |
