发明名称 Cleaning Systems and Methods for Semiconductor Substrate Storage Articles
摘要 Provided are methods and systems for cleaning various semiconductor substrate storage articles, in particular, FOUP doors. The FOUP doors and other similar articles often have openings that may get contaminated with cleaning liquids if not covered. The described cleaning system includes contact points for engaging the article and covering these openings. The contact points may be also used for supporting the article and for pressurizing the openings in the article with a gas. The gas may be supplied through one or more contact points. It prevents liquids from getting into the openings if even the openings are not completely sealed. The pressurization may be maintained through the entire wet portion of the cleaning process. The article may be rotated within the cleaning system while cleaning and/or other liquids or gases are dispensed through a set of spraying nozzles. Spraying nozzles may move to enhance cleaning of the article.
申请公布号 US2016303622(A1) 申请公布日期 2016.10.20
申请号 US201414517900 申请日期 2014.10.19
申请人 Brooks CCS GmbH 发明人 Rebstock Lutz
分类号 B08B9/34;B08B9/28 主分类号 B08B9/34
代理机构 代理人
主权项 1. A method for cleaning an article, the method comprising protecting an opening of the article with a gas flow; cleaning the article with a liquid.
地址 Radolfzell DE