发明名称 APPARATUS AND METHOD FOR PROFILING A BEAM OF A LIGHT EMITTING SEMICONDUCTOR DEVICE
摘要 Methods and apparatus (100) for profiling a beam of a light emitting semiconductor device. The apparatus comprises a light emitting semiconductor device (102) comprising an active region (108) formed on a substrate (104) and configured to generate light when a suitable electrical current is applied to contacts on an upper surface of the device and a light emitting surface (110) defined by a lower surface of the substrate opposite the contacts. The apparatus further comprises a transmission medium (112) comprising a first surface (114) in contact with at least part of the light emitting surface of the semiconductor device and a diffusion surface (116), opposite the first surface, and configured to diffuse light emitted from the micro-LED and transmitted through the transmission medium.
申请公布号 EP3080568(A1) 申请公布日期 2016.10.19
申请号 EP20140825113 申请日期 2014.12.10
申请人 INFINILED LIMITED 发明人 PERCIVAL, CHRISTOPHER;BRENNAN, VINCENT
分类号 G01J1/42;G01J1/02;G01J3/02;G01R31/26;H01L33/58 主分类号 G01J1/42
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