EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE

摘要

An exposure apparatus EX includes a recovery port 22 which recovers a liquid LQ, a blow port 32 which is provided outside the recovery port 22 with respect to an optical path space K1 and which blows a gas therefrom, and a gas discharge port 42 which is provided between the recovery port 22 and blow port 32 and which discharges at least a part of the gas blown from the blow port 32. An exposure apparatus which makes it possible to avoid the leakage of the liquid with which the optical path space of the exposure light between a projection optical system and a substrate is filled is provided.