发明名称 |
MASK-LESS FABRICATION OF THIN FILM BATTERIES |
摘要 |
Thin film batteries (TFB) are fabricated by a process which eliminates and/or minimizes the use of shadow masks. A selective laser ablation process, where the laser patterning process removes a layer or stack of layers while leaving layer(s) below intact, is used to meet certain or all of the patterning requirements. For die patterning from the substrate side, where the laser beam passes through the substrate before reaching the deposited layers, a die patterning assistance layer, such as an amorphous silicon layer or a microcrystalline silicon layer, may be used to achieve thermal stress mismatch induced laser ablation, which greatly reduces the laser energy required to remove material. |
申请公布号 |
EP2721663(B1) |
申请公布日期 |
2016.10.05 |
申请号 |
EP20120864769 |
申请日期 |
2012.06.14 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SONG, DAOYING;JIANG, CHONG;KWAK, BYUNG SUNG, LEO |
分类号 |
H01M2/10;H01M4/04;H01M4/139;H01M4/1395;H01M4/38;H01M6/00;H01M6/40;H01M10/04;H01M10/052;H01M10/0585;H01M10/36 |
主分类号 |
H01M2/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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