| 摘要 |
This substrate processing device is provided with: a plurality of processing units that each carry out processing of a substrate formed in a belt shape; a first processing chamber that accommodates first processing units, which can implement common subprocesses, among the plurality of processing units; a second processing chamber that accommodates second processing units among the plurality of processing units; and a transport unit that transports the substrate to both the first processing chamber and second processing chamber. |
