发明名称 |
PROCESS FOR PRODUCING AN EPITAXIAL SUBSTRATE FOR A SEMICONDUCTOR ELEMENT |
摘要 |
Provided is an epitaxial substrate having excellent two-dimensional electron gas characteristics and reduced internal stress due to strains. A channel layer is formed of a first group III nitride represented by In x1 Al y1 Ga z1 N (x1+y1+z1=1) so as to have a composition in a range determined by x1=0 and 0‰¤y1‰¤0.3. A barrier layer is formed of a second group III nitride represented by In x2 Al y2 Ga z2 N (x2+y2+z2=1) so as to have a composition, in a ternary phase diagram with InN, AlN and GaN being vertices, in a range surrounded by five straight lines determined in accordance with the composition (AlN molar fraction) of the first group III nitride. |
申请公布号 |
EP3067921(A1) |
申请公布日期 |
2016.09.14 |
申请号 |
EP20160166544 |
申请日期 |
2009.03.13 |
申请人 |
NGK INSULATORS, LTD. |
发明人 |
MIYOSHI, MAKOTO;KURAOKA, YOSHITAKA;SUMIYA, SHIGEAKI;TANAKA, MITSUHIRO |
分类号 |
H01L21/338;C23C16/34;C30B19/00;C30B23/02;C30B25/02;C30B29/38;C30B29/40;H01L21/02;H01L21/20;H01L21/205;H01L29/20;H01L29/201;H01L29/778;H01L29/812 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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