UNIT FOR SUPPLYING LIQUID, APPARATUS FOR TREATING SUBSTRATE WITH THE UNIT, AND METHOD FOR TREATING SUBSTRATE

摘要

An embodiment of the present invention provides substrate liquid-processing apparatus and method. The substrate processing apparatus includes: a substrate support unit supporting a substrate; and a liquid supply unit discharging a processing liquid onto the substrate supported by the substrate support unit. The liquid supply unit has: a stream nozzle having a circular stream outlet and discharging the processing liquid in a stream scheme; and a slit nozzle having a slit outlet in the shape of a slit and discharging the processing liquid in a liquid curtain scheme. Therefore, the stream nozzle and the slit nozzle can be individually used to mutually supplement the shortcomings generated in the liquid process.