| 发明名称 |
ATOMIC-LAYER DEPOSITION SUBSTRATE |
| 摘要 |
A substrate for fluidic levitation processing includes a moveable substrate and a levitation stabilizing structure located on the moveable substrate. The levitation stabilizing structure defines an enclosed interior impingement area of the moveable substrate that stabilizes lateral displacement of the moveable substrate during fluidic levitation processing. |
| 申请公布号 |
US2016240419(A1) |
申请公布日期 |
2016.08.18 |
| 申请号 |
US201514621432 |
申请日期 |
2015.02.13 |
| 申请人 |
Eastman Kodak Company |
发明人 |
Sieber Kurt D.;Ng Kam Chuen;Cok Ronald Steven |
| 分类号 |
H01L21/68;C23C16/458 |
主分类号 |
H01L21/68 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate for fluidic levitation processing comprising:
a moveable substrate; and a levitation stabilizing structure located on the moveable substrate defining an enclosed interior impingement area of the moveable substrate that stabilizes lateral displacement of the moveable substrate during fluidic levitation processing. |
| 地址 |
Rochester NY US |
