发明名称 温度制御システム及び温度制御方法
摘要 There is provided a temperature control system, including: a stage configured to support a workpiece and provided with a heat exchange medium flow path formed within the stage, the heat exchange medium flow path including a first end and a second end; a first valve; a second valve; a first heat exchange medium supply device including a supply port which supplies a first heat exchange medium adjusted to have a first temperature and a recovery port; a second heat exchange medium supply device including a supply port which supplies a second heat exchange medium adjusted to have a second temperature higher than the first temperature and a recovery port; and a control device configured to control the first and second valves such that the first and second heat exchange mediums are alternately supplied to the first end of the heat exchange medium flow path.
申请公布号 JP5970040(B2) 申请公布日期 2016.08.17
申请号 JP20140209699 申请日期 2014.10.14
申请人 東京エレクトロン株式会社 发明人 廣木 勤
分类号 G05D23/00;H01L21/3065 主分类号 G05D23/00
代理机构 代理人
主权项
地址