发明名称 電子デバイス又は他の部品上のコーティングに使用するハイブリッド層
摘要 A method for forming a coating over a surface is disclosed. The method comprises depositing over a surface, a hybrid layer comprising a mixture of a polymeric material and a non-polymeric material. The hybrid layer may have a single phase or comprise multiple phases. The hybrid layer is formed by chemical vapor deposition using a single source of precursor material. The chemical vapor deposition process may be plasma-enhanced and may be performed using a reactant gas. The precursor material may be an organo-silicon compound, such as a siloxane. The hybrid layer may comprise various types of polymeric Materials, such as silicone polymers, and various types of non-polymeric Materials, such as silicon oxides. By varying the reaction conditions, the wt% ratio of polymeric material to non-polymeric material may be adjusted. The hybrid layer may have various characteristics suitable for use with organic light-emitting devices, such as optical transparency, impermeability, and/or flexibility
申请公布号 JP5968931(B2) 申请公布日期 2016.08.10
申请号 JP20140036437 申请日期 2014.02.27
申请人 ザ、トラスティーズ オブ プリンストン ユニバーシティ 发明人 シーグルド・ワグナー;プラシャント・マンドリク
分类号 H05B33/10;C23C16/30;C23C16/50;H01L51/50;H05B33/04 主分类号 H05B33/10
代理机构 代理人
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