| 摘要 |
Disclosed is an exposure apparatus in which an overall frame (50) for supporting at least some of the constituent components of the apparatus and devices ancillary thereto is constituted from a plurality of units (52, 54, 56). Furthermore, each of the plurality of units (52, 54, 56) supports, for example, an illumination system (IOP), linear motor stators (71a,72a) for driving a mask stage, and a mask conveyance device (90). In this case, the construction of a single overall frame (50) from the plurality of units (52, 54, 56) makes it possible to impart sufficient strength to the frame as a whole. Accordingly, this facilitates the simple assembly of large exposure apparatuses. |
