LITHOGRAPHY SYSTEM AND METHOD OF PROCESSING SUBSTRATES IN SUCH A LITHOGRAPHY SYSTEM
摘要
The invention relates to a lithography system comprising a plurality of lithography system units. Each lithography system unit comprises a lithography apparatus arranged in a vacuum chamber for patterning a substrate; a load lock system for transferring substrates into and out of the vacuum chamber; and a door for enabling entry into the vacuum chamber for servicing purposes. The load lock system and the door of each lithography system unit are provided at the same side and face a free area at a side of the lithography system, in particular the service area.
申请公布号
EP2681624(B1)
申请公布日期
2016.07.20
申请号
EP20110802033
申请日期
2011.12.13
申请人
MAPPER LITHOGRAPHY IP B.V.
发明人
DE BOER, GUIDO;DE JONG, HENDRIK JAN;KUIPER, VINCENT SYLVESTER;SLOT, ERWIN