| 摘要 |
PURPOSE: A method for manufacturing a photoresist manufacturing composition is provided to dissolve the high concentration of an oxime ester-based photo polymerization initiator in the process of manufacturing a photoresist. CONSTITUTION: A method for manufacturing a photoresist manufacturing composition includes the following: a solvent composition is obtained by mixing an oxime ester-based photo polymerization initiator and a first solvent with at least one selected from a group including compounds represented by chemical formulas A1 to A5; the photoresist manufacturing composition is obtained by mixing the solvent composition and a second solvent which is miscible with the first solvent. |
