| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method capable of detecting discharge of process liquid from a nozzle reliably.SOLUTION: A upper surface process liquid nozzle 30 stops at a processing position above a substrate W, and then captures a discharge determination area SP continuously by means of a camera thus obtaining images for discharge determination. A standard deviation of the luminance value of pixels included in the images for discharge determination is then calculated, and a determination is made whether or not there is process liquid discharge from the upper surface process liquid nozzle 30 by comparing the standard deviation and a preset threshold. When the process liquid is not discharged, a structure in a chamber 10 reflected on the surface, i.e., mirror surface, of the substrate W is reflected on the discharge determination area SP, and the standard deviation of the luminance value of pixels of the images for discharge determination increases. Meanwhile, when the process liquid is discharged, the process liquid is reflected entirely on the discharge determination area SP, and the standard deviation of the luminance value of pixels of the images for discharge determination decreases.SELECTED DRAWING: Figure 8 |
