EXPOSURE APPARATUS AND METHOD FOR PRODUCING A DEVICE

摘要

There is provided an exposure apparatus (EX) capable of forming a desirable device pattern when performing exposure by projecting a pattern onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device projects an image of the pattern onto the substrate (P) via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a substrate alignment system (5) and a mask alignment system (6), and liquid immersion exposure is performed for the substrate while the substrate and the pattern image are aligned with each other based on measurements of the substrate and mask alignment systems.