发明名称 NANO STRUCTURE AND METHOD OF MANUFACTURING THE SAME
摘要 A nanostructure comprises: a plurality of sacrificial particles, which comprise a material that reacts with water, alcohol, an organic solvent, or acid and dissolves, and have a size or 100 nm or less; and a frame layer, which fills spaces between the sacrificial particles and is formed integrally with the sacrificial particles, and does not react with the water, the alcohol, and the organic solvent, and comprises a material that does not react with carbonic acid, low-concentration hydrochloric acid, low-concentration sulfuric acid, or low-concentration nitric acid, and thus has chemical stability. The nanostructure comprises: a base layer, which comprises the sacrificial particles and the frame layer, in which the frame layer seals the sacrificial particles; a surface layer, which is arranged on an upper portion of the base layer and comprises multiple pores and the frame layer, the pores being formed by dissolution of the sacrificial particles and the frame layer surrounding the pores, thereby forming a nano-scale porous medium; and a repair layer, which is arranged between the base layer and the surface layer, and comprises the sacrificial particles and a frame layer that seals the sacrificial particles, wherein, when a part of the surface layer is lost, some of the sacrificial particles are dissolved to thereby repair the nano-scale porous medium.
申请公布号 KR20160068663(A) 申请公布日期 2016.06.15
申请号 KR20150169657 申请日期 2015.12.01
申请人 WOWRO CO., LTD.;KIM, HYUNG IK 发明人 KIM, HYUNG IK
分类号 B82B1/00;B82B3/00;B82Y30/00 主分类号 B82B1/00
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