| 摘要 |
Provided are: a photosensitive composition that has excellent heat resistance, a low absorbance for g-ray, h-ray and i-ray exposure wavelengths, and high sensitivity; a resist material; a coating film thereof; and a novolac type phenol resin suitable for such applications; and manufacturing methods therefor. Specifically, provided is a novolac type phenol resin characterized in that the novolac type phenol resin is obtained by reacting a phenolic trinuclear compound (A) and formaldehyde in the presence of an acid catalyst. The phenolic trinuclear compound (A) comprises: a phenolic trinuclear compound (A1) obtained by a condensation reaction of a dialkyl-substituted phenol and a hydroxyl group-containing aromatic aldehyde; and a phenolic trinuclear compound (A2) obtained by a condensation reaction of a dialkyl-substituted phenol that has alkyl groups at positions 2 and 3, 2 and 5, 3 and 4, or 3 and 5, and an aromatic aldehyde that does not have a hydroxyl group. The molar ratio of the phenolic trinuclear compound (A1) and the phenolic trinuclear compound (A2) is 20:80 to 90:10. |
