| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus and an exposure method, by which distortion of an exposure target can be decreased and exposure with high accuracy can be performed.SOLUTION: An exposure apparatus 100 includes a laser light source 130 that emits laser light LL, a polygon mirror 160 that scans the laser light LL emitted from the laser light source 130, and a holding unit 115 that holds the exposure target substrate 200 and moves in a direction intersecting the scanning direction of the laser light LL. The holding unit 115 holds the exposure target substrate 200 to align an exposure target surface of the exposure target substrate 200 along a vertical direction.SELECTED DRAWING: Figure 1 |
