发明名称 Plasma Deposition Process with Removal of Substrate Tube
摘要 The present invention relates to a method of removing a substrate tube from the deposited layer inside of said substrate tube. In other words, the present invention relates to a method for manufacturing a precursor for a primary preform for optical fibres by means of an internal plasma deposition process, which method comprises the steps of providing a hollow substrate tube; creating a first plasma reaction zone having first reaction conditions in the interior of said hollow substrate tube by means of electromagnetic radiation for effecting the deposition of non-vitrified silica layers on the inner surface of said hollow substrate tube, and subsequently creating a second plasma reaction zone having second reaction conditions in the interior of said hollow substrate tube by means of electromagnetic radiation for effecting the deposition of vitrified silica layers on the non-vitrified silica layers deposited in the previous step; and removing the hollow substrate tube from the vitrified silica layers and the non-vitrified silica layers to obtain a deposited tube.
申请公布号 US2016152509(A1) 申请公布日期 2016.06.02
申请号 US201414902062 申请日期 2014.06.05
申请人 DRAKA COMTEQ B.V. 发明人 Milicevic Igor;Hartsuiker Johannes Antoon;Van Stralen Mattheus Jacobus Nicolaas;Krabshuis Gertjan
分类号 C03B37/018 主分类号 C03B37/018
代理机构 代理人
主权项 1. A method for manufacturing a precursor for a primary preform for optical fibres by means of an internal plasma deposition process, which method comprises the steps of: i) providing a hollow substrate tube; ii) creating a first plasma reaction zone having first reaction conditions in the interior of said hollow substrate tube by means of electromagnetic radiation for effecting the deposition of non-vitrified silica layers on the inner surface of said hollow substrate tube, and subsequently; iii) creating a second plasma reaction zone having second reaction conditions in the interior of said hollow substrate tube by means of electromagnetic radiation for effecting the deposition of vitrified silica layers on the non-vitrified silica layers deposited in step ii); iv) removing the hollow substrate tube from the vitrified silica layers deposited in step iii) and the non-vitrified silica layers deposited in step ii) to obtain a deposited tube.
地址 Amsterdam NL