发明名称 ガスバリア性フィルムおよび電子デバイス
摘要 PROBLEM TO BE SOLVED: To provide a gas barrier film very excellent in gas barrier property and durability, and having good productivity.SOLUTION: A gas barrier film has: a substrate 1; a gas barrier layer 4 formed by subjecting a layer containing polysilazane to an ultraviolet irradiation treatment; and an anchor coat layer 2 arranged between the substrate 1 and the gas barrier layer 4, and having 65-100 mass% metal compound particles (A) having a particle size of 1-200 nm, and a 0-35 mass% hydrophobic material (B)((A)+(B)=100 mass%).
申请公布号 JP5928634(B2) 申请公布日期 2016.06.01
申请号 JP20150093373 申请日期 2015.04.30
申请人 コニカミノルタ株式会社 发明人 森 孝博
分类号 B32B9/00 主分类号 B32B9/00
代理机构 代理人
主权项
地址