发明名称 Method and apparatus capable of synthesizing high-density wires in pores and on surface of porous material
摘要 According to an embodiment of the present invention, provided is a method of synthesizing nanowires that includes the following steps of: disposing a covering inside a reaction furnace such that the covering is spaced apart by a predetermined gap from a substrate which is provided for synthesis of nanowires; heating the reaction furnace; and synthesizing nanowires by allowing a source gas to be deposited on the substrate while flowing through the gap between the substrate and the covering.
申请公布号 US9353459(B2) 申请公布日期 2016.05.31
申请号 US201314077482 申请日期 2013.11.12
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY 发明人 Choi Doo Jin;Choi YooYoul
分类号 C23C16/00;C30B25/00;C30B29/18;C30B29/60;C23C16/04 主分类号 C23C16/00
代理机构 Lex IP Meister, PLLC 代理人 Lex IP Meister, PLLC
主权项 1. A method of synthesizing nanowires comprising following steps of: placing a substrate on which nanowires are to be synthesized inside a reaction furnace; disposing a covering inside a reaction furnace such that the covering is spaced apart by a predetermined gap from surfaces of the substrate and is arranged in parallel with the substrate; heating the reaction furnace; and synthesizing nanowires on the substrate by allowing a flow of a source gas of organic silicon compound into the reaction furnace, the source gas of organic silicon compound being deposited on the substrate while flowing through the predetermined gap between the substrate and the covering, wherein the covering retards the flow of the source gas of organic silicon compound while flowing through the predetermined gap between the substrate and the covering, the method of synthesizing nanowires is devoid of any catalysts, and the nanowires synthesized on the surfaces of the substrate have a clearer shape as a size of the predetermined gap between the substrate and the covering decreases.
地址 Seoul KR