发明名称 |
Fabrication of graphene nanoribbons and nanowires using a meniscus as an etch mask |
摘要 |
In some embodiments, the present disclosure pertains to methods of preparing graphene nanoribbons from a graphene film associated with a meniscus, where the method comprises patterning the graphene film while the meniscus acts as a mask above a region of the graphene film, and where the patterning results in formation of graphene nanoribbons from the meniscus-masked region of the graphene film. Additional embodiments of the present disclosure pertain to methods of preparing wires from a film associated with a meniscus, where the method comprises patterning the film while the meniscus acts as a mask above a region of the film, and where the patterning results in formation of a wire from the meniscus-masked region of the film. Additional embodiments of the present disclosure pertain to chemical methods of preparing wires from water-reactive materials. |
申请公布号 |
US9356151(B2) |
申请公布日期 |
2016.05.31 |
申请号 |
US201414171642 |
申请日期 |
2014.02.03 |
申请人 |
WILLIAM MARSH RICE UNIVERSITY |
发明人 |
Tour James M.;Abramova Vera;Slesarev Alexander |
分类号 |
H01L21/44;H01L29/786;C01B31/04;H01L21/3065;H01L21/311;H01L21/3213;H01L29/66;B82Y40/00 |
主分类号 |
H01L21/44 |
代理机构 |
Winstead PC |
代理人 |
Winstead PC |
主权项 |
1. A method of preparing graphene nanoribbons from a graphene film associated with a meniscus, wherein the method comprises:
patterning the graphene film while the meniscus acts as a mask above a region of the graphene film, wherein the meniscus comprises a concave surface, and wherein the patterning results in formation of graphene nanoribbons from the meniscus-masked region of the graphene film. |
地址 |
Houston TX US |