发明名称 Fabrication of graphene nanoribbons and nanowires using a meniscus as an etch mask
摘要 In some embodiments, the present disclosure pertains to methods of preparing graphene nanoribbons from a graphene film associated with a meniscus, where the method comprises patterning the graphene film while the meniscus acts as a mask above a region of the graphene film, and where the patterning results in formation of graphene nanoribbons from the meniscus-masked region of the graphene film. Additional embodiments of the present disclosure pertain to methods of preparing wires from a film associated with a meniscus, where the method comprises patterning the film while the meniscus acts as a mask above a region of the film, and where the patterning results in formation of a wire from the meniscus-masked region of the film. Additional embodiments of the present disclosure pertain to chemical methods of preparing wires from water-reactive materials.
申请公布号 US9356151(B2) 申请公布日期 2016.05.31
申请号 US201414171642 申请日期 2014.02.03
申请人 WILLIAM MARSH RICE UNIVERSITY 发明人 Tour James M.;Abramova Vera;Slesarev Alexander
分类号 H01L21/44;H01L29/786;C01B31/04;H01L21/3065;H01L21/311;H01L21/3213;H01L29/66;B82Y40/00 主分类号 H01L21/44
代理机构 Winstead PC 代理人 Winstead PC
主权项 1. A method of preparing graphene nanoribbons from a graphene film associated with a meniscus, wherein the method comprises: patterning the graphene film while the meniscus acts as a mask above a region of the graphene film, wherein the meniscus comprises a concave surface, and wherein the patterning results in formation of graphene nanoribbons from the meniscus-masked region of the graphene film.
地址 Houston TX US