发明名称 Polarized light irradiating apparatus and method of irradiating polarized light for photo alignment
摘要 An apparatus capable of performing a photo alignment process on a plate-shaped member and realizing high productivity is provided. An irradiating unit irradiates an irradiated area with polarized light, and a stage movement mechanism transports first and second stages on which substrates are mounted alternately to the irradiated area and returns the same. A space larger than a length by which the substrate on the second stage passes through the irradiated area is secured between the first stage positioned at a first substrate mounting-and-collecting position and the irradiated area, and a space larger than a length by which the substrate on the first stage passes through the irradiated area is secured between the second stage positioned at a second substrate mounting-and-collecting position and the irradiated area.
申请公布号 US9354472(B2) 申请公布日期 2016.05.31
申请号 US201414201159 申请日期 2014.03.07
申请人 Ushio Denki Kabushiki Kaisha 发明人 Sato Shingo
分类号 G02F1/1337;G02F1/13 主分类号 G02F1/1337
代理机构 Michael Best & Friedrich LLP 代理人 Michael Best & Friedrich LLP
主权项 1. A polarized light irradiating apparatus for photo alignment comprising: an irradiating unit configured to irradiate a preset irradiated area with polarized light; a stage on which a substrate is placed; and a stage movement mechanism configured to cause the substrate on the stage to be irradiated with the polarized light by moving the stage to the irradiated area, wherein the stage includes two of first and second stages; the stage movement mechanism is configured to move the first stage from a first substrate mounting position set on one side of the irradiated area to the irradiated area and to move the second stage from a second substrate mounting position set on the other side of the irradiated area to the irradiated area, the stage movement mechanism is configured to return the first stage to a first side after passage of the substrate on the first stage through the irradiated area and to return the second stage to a second side after passage of the substrate on the second stage through the irradiated area, and a space larger than a length by which the substrate on the second stage passes through the irradiated area is secured between the first stage positioned at the first substrate mounting position and the irradiated area, and a space larger than a length by which the substrate on the first stage passes through the irradiated area is secured between the second stage positioned at the second substrate mounting position and the irradiated area.
地址 Tokyo JP