发明名称 PHOTOCURABLE COMPOSITION, METHODS FOR PRODUCING FILM, OPTICAL COMPONENT, CIRCUIT BOARD, AND ELECTRONIC COMPONENT BY USING THE SAME, AND CURED PRODUCT
摘要 An imprint method that uses a condensable gas process has a problem in that the surface of a resist cured film is rough. This is resolved by a photocurable composition used for performing imprint in an atmosphere containing a condensable gas. The photocurable composition contains a component (A) which is a (meth)acrylate monomer, a component (B) which is a photopolymerization initiator, and a component (C) which is a mold releasing agent. A saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 5% by weight or less, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.
申请公布号 US2016144554(A1) 申请公布日期 2016.05.26
申请号 US201414900593 申请日期 2014.06.19
申请人 CANON KABUSHIKI KAISHA 发明人 Yonezawa Shiori;Ito Toshiki;Yamashita Keiji;Chiba Keiko;Kawasaki Youji
分类号 B29C59/00;G03F7/00;B29C59/02;C08L33/08 主分类号 B29C59/00
代理机构 代理人
主权项 1. A photocurable composition used for performing imprint in an atmosphere containing a condensable gas, the photocurable composition comprising: a component (A) which is a (meth)acrylate monomer; a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent, wherein a saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 5% by weight or less, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.
地址 Ohta-ku, Tokyo JP