发明名称 |
PHOTOCURABLE COMPOSITION, METHODS FOR PRODUCING FILM, OPTICAL COMPONENT, CIRCUIT BOARD, AND ELECTRONIC COMPONENT BY USING THE SAME, AND CURED PRODUCT |
摘要 |
An imprint method that uses a condensable gas process has a problem in that the surface of a resist cured film is rough. This is resolved by a photocurable composition used for performing imprint in an atmosphere containing a condensable gas. The photocurable composition contains a component (A) which is a (meth)acrylate monomer, a component (B) which is a photopolymerization initiator, and a component (C) which is a mold releasing agent. A saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 5% by weight or less, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm. |
申请公布号 |
US2016144554(A1) |
申请公布日期 |
2016.05.26 |
申请号 |
US201414900593 |
申请日期 |
2014.06.19 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Yonezawa Shiori;Ito Toshiki;Yamashita Keiji;Chiba Keiko;Kawasaki Youji |
分类号 |
B29C59/00;G03F7/00;B29C59/02;C08L33/08 |
主分类号 |
B29C59/00 |
代理机构 |
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代理人 |
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主权项 |
1. A photocurable composition used for performing imprint in an atmosphere containing a condensable gas, the photocurable composition comprising:
a component (A) which is a (meth)acrylate monomer; a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent, wherein a saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 5% by weight or less, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm. |
地址 |
Ohta-ku, Tokyo JP |