发明名称 SUBSTRATE HOLDER, PLASMA REACTOR AND METHOD FOR DEPOSITING DIAMOND
摘要 A substrate holder having a base plate where a plurality of protruding poles is arranged, said poles spaced apart from one another by intermediate spaces. Alternatively or in addition, a plasma reactor for depositing diamond from the gas phase may be provided, the plasma reactor comprising such a substrate holder. A method for depositing diamond from the gas phase may be provided.
申请公布号 US2016138189(A1) 申请公布日期 2016.05.19
申请号 US201514937359 申请日期 2015.11.10
申请人 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. 发明人 NEBEL Christoph E.;MÜLLER-SEBERT Wolfgang;WIDMANN Claudia;HEIDRICH Nicola;SCHREYVOGEL Christoph
分类号 C30B25/12;C23C16/27;C23C16/458;C30B25/20;C30B29/04 主分类号 C30B25/12
代理机构 代理人
主权项 1. Substrate holder having a base plate, wherein a plurality of protruding poles is arranged on the base plate, said poles being spaced apart from one another by intermediate spaces.
地址 Munich DE