| 发明名称 |
Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL, AND METHOD OF PRODUCING SAME |
| 摘要 |
Provided is a Fe—Co-based alloy sputtering target material having a composition represented as an atomic ratio by the compositional formula: (Fea—Co100-a)100-b-c-d—Tab—Nbc-Md, wherein 0<a≦80, 0≦b≦10, 0≦c≦15, 5≦b+c≦15, 2≦d≦20, 15≦b+c+d≦25, and M represents one or more elements selected from the group consisting of Mo, Cr and W, with the balance consisting of unavoidable impurities, wherein the sputtering target material has a bending fracture strain εfB at 300° C. of 0.4% or more. |
| 申请公布号 |
US2016141158(A1) |
申请公布日期 |
2016.05.19 |
| 申请号 |
US201615008433 |
申请日期 |
2016.01.27 |
| 申请人 |
HITACHI METALS, LTD. |
发明人 |
FUKUOKA Jun;SAITO Kazuya;SAKAMAKI Kouichi;HATA Tomoyuki |
| 分类号 |
H01J37/34;C23C14/34;C22C30/00;B22F3/14;C22C19/07;C23C14/14;H01F41/18 |
主分类号 |
H01J37/34 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A Fe—Co-based alloy sputtering target material having a composition represented as an atomic ratio by the compositional formula: (Fea—Co100-a)100-b-c-d—Tab—Nbc-Md, wherein 0<a≦80, 0≦b≦10, 0≦c≦15, 5≦b+c≦15, 7≦d≦20, 15≦b+c+d≦25, and M represents one or more elements selected from the group consisting of Mo, Cr and W, with the balance consisting of unavoidable impurities, wherein the sputtering target material has a bending fracture strain εfB at 300° C. of 0.4% or more. |
| 地址 |
Tokyo JP |
