| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novolak phenol resin that enables production of photoresist with high heat resistance, high sensitivity, a high residual film ratio, and high resolution, for the photoresist used in lithography when producing a semiconductor and an LCD (liquid crystal display). <P>SOLUTION: A photoresist composition contains (A) novolak phenol resin obtained by reacting (a) phenol component containing m-cresol and/or p-cresol with (b) aldehyde component containing polyaldehyde, (B) photosensitive agent, and (C) propylene glycol monomethyl ether acetate and γ-butyrolactone. <P>COPYRIGHT: (C)2013,JPO&INPIT |
