METHOD FOR MEASURING CARBON CONCENTRATION IN POLYCRYSTALLINE SILICON

摘要

The present invention provides a method for making it possible to easily and simply measure approximate concentration of substitutional carbon impurities in a desired position in a polycrystalline silicon rod. A polycrystalline silicon plate is sliced out from a polycrystalline silicon rod and both surfaces of the polycrystalline silicon plate are mirror-polished to reduce the polycrystalline silicon plate to thickness of 2.12±0.01 mm. A calibration curve is created according to an infrared absorption spectroscopy and on the basis of a standard measurement method using a single crystal silicon standard sample having known substitutional carbon concentration and thickness of 2.00±0.01 mm, an infrared absorption spectrum in a frequency domain including an absorption zone peak of substitutional carbon of the polycrystalline silicon plate after the mirror polishing is calculated under conditions same as conditions during the calibration curve creation, and substitutional carbon concentration is calculated without performing thickness correction.