| 发明名称 |
TEST STRUCTURE FOR MONITORING LINER OXIDATION |
| 摘要 |
Embodiments of a method for forming a device using test structures are presented. The method includes providing a wafer with a device layer. The device layer includes a main device region and a perimeter region. The device layer is patterned with active and test patterns. Test patterns include dummy patterns disposed in a test device area. The wafer is processed to form at least one test device disposed in the perimeter region and one or more active devices disposed in the main device region. The test device determines a design window of the one or more active devices. Additional processing is performed to complete forming the device. |
| 申请公布号 |
US2016133531(A1) |
申请公布日期 |
2016.05.12 |
| 申请号 |
US201414538811 |
申请日期 |
2014.11.12 |
| 申请人 |
GLOBALFOUNDRIES Singapore Pte. Ltd. |
发明人 |
YI Wanbing;WANG Daxiang;TAN Juan Boon;LIN Kemao;ZHANG Shaoqiang |
| 分类号 |
H01L21/66;H01L49/02;H01L23/00;H01L21/02 |
主分类号 |
H01L21/66 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of forming a device comprising:
providing a wafer, the wafer comprises a device layer having a main device region and a perimeter region; patterning the device layer with active and test patterns, wherein the test pattern comprises dummy patterns disposed in a test device area; processing the wafer, wherein the process forms at least one test device disposed in the perimeter region, and one or more active devices disposed in the main device region, wherein the test device determines a design window of the one or more active devices; and performing additional processing to complete forming the device. |
| 地址 |
Singapore SG |
